The necessity of nanoscale materials and its possible applications are ever increasing recently. Versatile properties of nanoscale materials can be even modulated by surface modification or coating using solution-based technique or vapor deposition. Among the various vapor deposition techniques, atomic scale processing for powder materials including atomic layer deposition (ALD) and atomic layer etching (ALE) can control the film thickness, morphology, and chemical nature at nanoscale. In this symposium, the principles of ALD and ALE technique will be introduced and issues to be overcome will be dealt with special emphasis on the powder materials. Materials characterization and theoretical understanding of a surface modification of nanoscale materials are also of great importance. Emerging applications where this technology is being explored, such as batteries, fuel cells, thermoelectrics, catalysts, cosmetics, will be introduced in this symposium.
- Atomic scale processing on powder materials
- Atomic layer deposition and atomic layer etching
- Surface modifications and coatings
- Functional improvements by nanoscale coating
- Characterization and theoretical simulation of nanoscale coating
- Applications in energy and other systems
Prof. Tae Joo Park
Hanyang University, Ansan, Republic of Korea
Tel +82-31-400-5223, Fax +82-31-436-8146
tjp@hanyang.ac.kr
Prof. Byung Joon Choi
Seoul National University of Science and Technology, Seoul, Republic of Korea
Tel +82-2-970-6641, Fax +82-2-973-6657
bjchoi@seoultech.ac.kr
| Archives of Metallurgy and Materials |
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| ISSN: 1733-3490 eISSN: 2300-1909 |
| SCIE(I. F. 0.586) |